Subwavelength Grating Engineering


 Develop design strategies to take advantage of technological advances that will appear in high resolution lithography

  • Deep UV-193nm: 100nm minimum feature size
  • Extreme UV-13.5nm: 10nm minimum feature size (ASML)

Different applications: communications, imaging,microspectrometer, biosensors

High contrast SoI technologies


Engineering the birrefringence


Engineering the Dispersion









Check out Robert Halir's OSA webinar:

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