Subwavelength Grating Engineering

 

 Develop design strategies to take advantage of technological advances that will appear in high resolution lithography

  • Deep UV-193nm: 100nm minimum feature size
  • Extreme UV-13.5nm: 10nm minimum feature size (ASML)

Different applications: communications, imaging,microspectrometer, biosensors

High contrast SoI technologies

 

Engineering the birrefringence

 

Engineering the Dispersion